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Field Ion Microscopy (FIM)

Field Emission Microscopy (FEM)

Pulse Field Desorption Mass Spectrometry (PFDMS)

Three-dimensional Atomic Probe

The Field Ion Microscope (FIM) is placed in a home-built all-metal UHV chamber connected to a reaction chamber via a sample transfer system. Metallic samples are prepared in the form of tips which resemble nearly hemispherically shaped crystals with radii of curvature between ~5 and 100 nm. The surface structure of these crystals, either clean or adsorbate-covered, is imaged with atomic resolution in real-space. Pulsed Field Desorption Mass Spectrometry (PFDMS) is a local chemical probe and combines FIM with time-of-flight analysis of surface species field desorbed as ions. The method can be applied during a surface chemical reaction and enables the elucidation of the mechanism and kinetics of this reaction by changing the repetition frequency of the desorbing field pulses. The monitored surface area in PFDMS comprises between 10 and 400 surface atoms.


Field Ion Microscope

The Field Emission Microscope (FEM) corresponds to the same microscope, but the sample is negatively polarized under UHV conditions. In that case, the field emission pattern represents the probability of emission by tunneling effect.

Pulsed Field Desorption Mass Spectrometry (PFDMS) is a local chemical probe and combines FIM with time-of-flight analysis of surface species field desorbed as ions. The method can be applied during a surface chemical reaction and enables the elucidation of the mechanism and kinetics of this reaction by changing the repetition frequency of the desorbing field pulses. The monitored surface area in PFDMS comprises between 10 and 400 surface atoms.


PFMDS analysis

Three-dimensional atom probe (3DAP) is a technique which combines the field desorption mass spectrometry with a position sensitive single ion detector. Combining the ionic position of the impact, the time-of-flight and the chronology of the impacts allows the 3D reconstruction of the sample with nanometric lateral resolution and atomic depth resolution. The method requires UHV conditions. A reaction cell added to the system allows gas exposure over the sample,from high vacuum to atmospheric pressure at temperatures ranging from 293K to 1000K.


3D-AP analyzer